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Optical photolitography

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Scientific supervisor

Name prof. Jakub Rysz
Email: jakub.rysz@uj.edu.pl
Department Department of Advanced Materials Engineering
Laboratory Organic Electronic Laboratory
Group webpage  

Short description

Photolithography is used in many branches of modern technology. Production lines of motherboards, processors or microelectomechanical devices (MEMS) are based on this process. Photolithography is a multi-stage process that starts with the application of a photosensitive layer (photoresist) on the substrate. In the next step, the photoresist is irradiated in such a way that after developing, it forms a given pattern, partially revealing the substrate. subsequently, a metallic layer can be deposited on top of the substrate or the substrate can be immersed in an etching solution.

During the internship, you will be able to familiarize yourself with the entire process of photolithography and the use of this method to create electrodes for organic electronics systems on a micron scale and simple microfluidic devices. Those interested will also be familiarized with Atomic Force Microscopy, which will be used to image the structures produced.

Main research tools

  • Spin-coating
  • imagesetter
  • optical microscope
  • Scanning Probe Microscope

Additional requirements to the candidate

  • Eagerness for laboratory work

Possibility to continue student internship in the form of:

  • Diploma thesis (master's or bachelor's degree): Yes
  • PhD study: Yes